RICHARDSON, Texas -- Optical Switch Corporation (OSC), announced today the installation and final acceptance of its Model PC2, high-resolution lithography system by JDS Uniphase, Eindhoven, The Netherlands. The interference lithography based Model PC2, developed by OSC’s Microphotonics Group in Bedford, Massachusetts, generates 190nm to 260nm period grating structures with a fully automated, high throughput patterning tool and process. OSC’s patented interference lithography systems, including the Model PC2, fully automate the calibration and reconfiguration of lithography applications, making the OSC systems more cost efficient and operationally precise than conventional lithography equipment. In addition, the OSC systems reduce processing times from hours to minutes. “OSC has clearly demonstrated a high caliber of expertise in this area, as well as providing an unsurpassed level of commitment to this project,” said Arthur Weesie, senior purchasing manager at JDS Uniphase, Eindhoven, The Netherlands. “The Model PC2 enables the generation of grating structures required in a high throughput, stabile production process,” said Jim Nole, marketing manager for OSC’s Microphotonics Group. “OSC has completely automated the interference lithography process, and our complete line of systems are being readily adopted in a variety of application areas that require extremely uniform, ultra-high resolution lithography at a low cost of ownership.”Optical Switch Corp.JDS Uniphase Inc.