New program, the Thin Film Technology Platform, to identify, develop, and promote new products based on thin-film materials and processes

January 23, 2002

1 Min Read

MIDLAND, Mich. -- Dow Corning Corp. launched a new program, the Thin Film Technology Platform, to identify, develop and promote new products based on thin-film materials and processes. The platform was established to support and serve the company's high- growth electronics and new ventures business units, which include efforts in energy, photonics, plasma, flat panel displays, semiconductor device fabrication and packaging. The scope of the program will be the identification of high-value applications for next-generation, silicon-based thin films, development of process chemistry, characterization of film performance and integration of high-volume deposition processes technology. The effort is firmly supported by a state-of-the-art thin-film characterization laboratory in Midland and a worldwide team of researchers. "The Thin Film Technology Platform is a critical step to establishing the foundation for long-term growth and leadership in high-technology businesses, and I am honored for the opportunity to direct this effort," said Mark Loboda, associate research scientist and team leader for Dow Corning's Thin Film Technology Platform. "This platform unifies the resources, expertise and technology needed to successfully create and execute the delivery of new high- value products to the marketplace."Dow Corning Corp.

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