Photline Technologies announces the release of NIR-LN modulators, a complete family of 1064 nm lithium niobate (LiNb03) modulators

August 1, 2003

1 Min Read

BESANÇON, France -- Photline Technologies announces the release of NIR-LN modulators, a complete family of 1064 nm lithium niobate modulators.

Lithium niobate (LiNb03) modulators have been widely used since the mid- nineties in long haul optical networks for their ability to modulate optical signal from laser diodes with short transition times and without chirp.

The intrinsic and unparalleled benefits of LiNbO3 modulators make them attractive devices for a variety of applications outside from the telecommunication domain : fiber optics sensors, laser material processing, free space communication, instrumentation… Those applications often use transmission wavelengths outside from the 1300 nm and the 1550 nm windows used by fiber optics telecommunications, thus limiting the choice of available optical components.

New Photline NIR-LN intensity and phase modulators family for 1064 nm region offers to the engineers of those emerging applications a choice of modulation devices comparable to what exists for the telecommunications and with bandwidths up to above 10 Gb/s.

The NIR-LN modulators waveguides are manufactured using proton exchange, the sole technology at that wavelength that leads to sufficient optical power threshold of photo-refractive and non-linear effects.

“The NIR-LN range demonstrates Photline sound technological foundations and the continued commitment of the company to bring to the market a complete range of modulation solutions for a wide variety of applications, at cost effective price.” explains Henri Porte, CEO of the company.

NIR-LN modulators family will be displayed on Photline booth (500H) at ECOC exhibition, Rimini, September 22-24.

Photline Technologies

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