Ibsen has been awarded patent for production technique of high-volume, sub-micron period gratings

June 18, 2004

1 Min Read

COPENHAGEN -- Ibsen Photonics, a leading supplier of holographic Phase masks, transmission diffraction gratings and DWDM monitors based on diffraction gratings, today announced that it has been granted United States Patent # 6,693,701, titled "Method and Apparatus for Diffractive Transfer of Grating Mask".

This technology allows manufacturers to print sub-micron grating periods by further advancing the manufacturability provided by NFH technology which involves replicating Phase mask structures via a mask aligner.

"NFH has for several years been a mature volume-oriented grating production technology. Ibsen continuously works to increase the breadth of applications that NFH can be used for, as well as further increasing the cost-effectiveness of NFH technology. This patent is one example of our efforts and results in this field." says Brian Dissing, NFH Process manager at Ibsen.

Elmar Cullmann, Consultant with Suss MicroTec, adds: "NFH builds on the versatility of our mask aligners. Together with Ibsen Photonics we have provided and will continue to provide great advances to the semiconductor market in terms of providing a technology for low-cost manufacture of sub-micron period gratings."

Ibsen Photonics A/S

SUSS MicroTec Inc.

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